Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation.

ABSTRACT: An attenuation of visible probe radiation identified in earlier absorption studies of microwave plasma-activated CH₄/H₂/Ar gas mixtures is shown to arise from nanoparticles in under-pumped regions on opposing sides of a reactor used for diamond chemical vapor deposition. The present modeling studies highlight (i) ejection of Si-containing species into the gas phase by reactive radical etching of the quartz window through which the microwave radiation enters the reactor, enabled by suitably high window temperatures (T_SiO2) and the synergistic action of near-window H atoms and C_yH_x radicals; (ii) subsequent processing of the ejected material, some of which are transported to and accumulate in stagnation regions in th

SUBMITTER: Ashfold MNR 

PROVIDER: S-EPMC11664594 | biostudies-literature | 2024 Dec

REPOSITORIES: biostudies-literature