Impact of electron cyclotron wave resonance plasma on defect reduction in ZnO thin films.

ABSTRACT: This study presents the fabrication of highly photosensitive undoped zinc oxide (ZnO) thin films for vacuum ultraviolet (VUV) radiation detection, covering the wavelength range of 100-200 nm. ZnO films were deposited using hybrid pulsed reactive magnetron sputtering, assisted by ECWR (electron cyclotron wave resonance) plasma. Control of the ECWR power (P_ECWR), ranging from 0 to 380 W, played a crucial role in enhancing the films' photoconductive properties. At P_ECWR = 200 W, the photosensitivity increased by 8 orders of magnitude compared to films deposited without ECWR assistance. This improvement was attributed to a sharp reduction in dark current due to lower defect density. Photoluminescence and cathodoluminescence spectra revealed a significant reduction in defe

SUBMITTER: Hibino K 

PROVIDER: S-EPMC11829018 | biostudies-literature | 2025 Feb

REPOSITORIES: biostudies-literature