Plasma-Enhanced Spatial Atomic Layer Deposition on 2D and 3D Surface Topologies: The Case of Amorphous and Crystalline TiO₂.

ABSTRACT: Plasma-enhanced spatial ALD (PE-s-ALD) is an interesting technique for high-volume manufacturing of thin films at low-temperature. This technique is particularly appealing for conformal depositions on 3D surfaces for various applications, such as optical coatings, electrolyzers, and batteries. However, various crystallization and growth effects can influence the final film profile and properties, and understanding these effects and their interplay is key. This study investigates the complex growth mechanism of TiO₂ using PE-s-ALD. TiO₂ films are deposited on both planar and 3D substrates, while systematically varying the number of cycles, deposition temperature, and exposure times. Thickness, crystallinity, and composition are determined as a function of depth inside

SUBMITTER: van de Poll M 

PROVIDER: S-EPMC11831676 | biostudies-literature | 2025 Feb

REPOSITORIES: biostudies-literature