Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating.

ABSTRACT: The scanning interference field exposure technique is an effective method to fabricate holographic diffraction grating with meter-level size and nano-level precision. The main problems of fabricating large-aperture and high-precision grating by this technique are the high-precision displacement measurement of the stage, the high-precision control of the interference fringe and the real time compensation of the grating phase error. In this paper, the influence of grating groove error on the wavefront aberration is analyzed. In order to improve the precision of the stage with displacement range more than one meter, an integrated displacement measurement combining grating sensing and laser interferometry is proposed, which suppresses the influence of environment on measurement precision under

SUBMITTER: Li W 

PROVIDER: S-EPMC11882855 | biostudies-literature | 2025 Mar

REPOSITORIES: biostudies-literature