Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer.

ABSTRACT: Micro- and nanopatterned surfaces are highly useful as functional surfaces and in the fabrication of electronic and optical devices. Transferring high-resolution patterns into a photoresistive layer or the substrate surface is a crucial step in fabricating a nanostructure with gratings, pillar arrays, and hole arrays. In this work, a very simple yet efficient and high-throughput route for pattern transfer was investigated based on the self-assembly of block copolymers (BCPs). The high etch contrast and high density of the periodic pillar array require a vertically oriented structure of the cylinder-forming BCP. Solvent-vapor annealing under fine-tuned conditions allowed us to control the orientation of the BCP microdomains relative to the surface. Liquid-phase infiltration (LPI) of metal i

SUBMITTER: Kim CE 

PROVIDER: S-EPMC11886647 | biostudies-literature | 2025 Mar

REPOSITORIES: biostudies-literature