Tailoring of physical properties of RF-sputtered ZnTe films: role of substrate temperature.

ABSTRACT: In this study, zinc telluride (ZnTe) films were grown on quartz substrates at room temperature, 300 °C, 400 °C, 500 °C, and 600 °C using RF sputtering. The thickness of the films has been found to decrease from 940 nm at room temperature to 200 nm at 600 °C with increasing substrate temperature. The structural investigation using grazing incidence angle X-ray diffraction revealed that films deposited at room temperature are amorphous; those deposited at other substrate temperatures are polycrystalline with a cubic zincblende structure and a preferred orientation along the [111] direction. An increase in crystallite size (from 37.60 ± 0.42 Å to 68.88 ± 1.04 Å) is observed with increased substrate temperature. This leads to a reduction in microstrain and dislocation density. The optical stud

SUBMITTER: Devi K 

PROVIDER: S-EPMC11897647 | biostudies-literature | 2025

REPOSITORIES: biostudies-literature