Effect of Structurally Modified Toluene Diisocyanate-Based Polyurethane Pads on Chemical Mechanical Polishing of 4H Silicon Carbide Substrate.

ABSTRACT: This study investigates the impact of polycarbonate diol (PCDL)-modified toluene diisocyanate (TDI)-based polyester polyurethane polishing pads on the chemical mechanical polishing of 4H silicon carbide (4H-SiC) substrates. Employing a unique metho, PCDL alters the ratio of polyurethane soft and hard segments, facilitating the one-step synthesis of a polishing pad via chemical foaming. The extent of the reaction of isocyanate groups was characterized by Fourier transform infrared spectroscopy, while the changes in the glass transition temperature of the material before and after modification were evaluated using differential scanning calorimetry. The mechanical properties and surface morphology of the modified pad have been systematically characterized. The results showed that compared wit

SUBMITTER: Meng Y 

PROVIDER: S-EPMC11902601 | biostudies-literature | 2025 Feb

REPOSITORIES: biostudies-literature