2D edge-seeded heteroepitaxy of ultrathin high-κ dielectric CaNb<sub>2</sub>O<sub>6</sub> for 2D field-effect transistors.
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ABSTRACT: The experimental realization of single-crystalline high-κ dielectrics beyond two-dimensional (2D) layered materials is highly desirable for nanoscale field-effect transistors (FETs). However, the scalable synthesis of 2D nonlayered high-κ insulators is currently limited by uncontrolled isotropic three-dimensional growth, hampering the achievement of simultaneous high dielectric constants and low trap densities for small film thicknesses. Herein, we show a 2D edge-seeded heteroepitaxial strategy to synthesize ultrathin nonlayered 2D CaNb2O6 nanosheets by chemical vapor deposition, exhibiting high-crystalline quality, thickness-independent dielectric constant (~ 16) and breakdown field strength up to ~ 12 MV cm-1. The MoS2/CaNb2O6</
SUBMITTER: Fan X
PROVIDER: S-EPMC11911405 | biostudies-literature | 2025 Mar
REPOSITORIES: biostudies-literature
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