ALD-Deposited Hydroxyl-Rich NiO_x to Enhance SAM Anchoring for Stable and Efficient Perovskite Solar Cells.

ABSTRACT: The interface between nickel oxide (NiO_x) and self-assembled monolayers (SAMs) in perovskite solar cells (PSCs) often suffers from limited adsorption strength, poor energy-level alignment, and inadequate defect passivation, which hinder device performance and stability. To address these issues, we introduce a hybrid hole selective layer (HSL) combining atomic layer deposition (ALD)-fabricated NiO_x with full-aromatic SAM molecules, creating a highly stable and efficient interface. ALD NiO_x, enriched with hydroxyl groups, provides robust adsorption sites for the SAM molecule MeO-PhPACz, ensuring a strong, stable interaction. This hybrid HSL enhances energy-level alignment, hole selectivity, and defect passivation at the NiO_x/perovskite interface. D

SUBMITTER: Guo F 

PROVIDER: S-EPMC11946364 | biostudies-literature | 2025 Mar

REPOSITORIES: biostudies-literature