Advanced Atomic Layer Modulation Based Highly Homogeneous PtRu Precious Metals Alloy Thin Films.

ABSTRACT: Atomic layer modulation (ALM) presents a novel approach for controlling the stoichiometry of platinum-ruthenium (PtRu) alloys rather than a tedious atomic layer deposition (ALD) supercycling multielement ALD process. This method sequentially pulses dimethyl-(N,N-dimethyl-3-butene-1-amine-N)platinum (C₈H₁₉NPt, DDAP) and tricarbonyl(trimethylenemethane)ruthenium [Ru(TMM)(CO)₃] precursors with O₂ as a counter reactant at 225 °C to produce ALM-PtRu bimetallic alloys at the nanoscale. By smartly adjusting precursor pulsing times and temperatures, the average surface composition during growth can be modulated, achieving precise control over the PtRu alloy stoichiometry. Aberration-corrected ultra-high-resolution scanning transmission electron microscop

SUBMITTER: Son Y 

PROVIDER: S-EPMC12362800 | biostudies-literature | 2025 Aug

REPOSITORIES: biostudies-literature