Near-Field Optical Nanopatterning of Graphene.

ABSTRACT: 2D materials are emerging as transformative platforms for next-generation memory, sensing, photonic, and quantum devices due to their extraordinary optical, mechanical, and electronic properties. A key challenge is achieving controlled and precise nanopatterning to unlock tailored functionalities. This work uses a direct laser writing method to introduce a near-field-mediated nanopatterning technique that delivers ≈10-30 nm lateral and sub-5 nm vertical modification on graphene under ambient conditions. This approach uses a pulsed femtosecond laser in the visible wavelength range with scattering-type scanning near-field optical microscopy (s-SNOM), where the s-SNOM tip serves as a nanoscale probe. The resultant nanopatterns exhibit highly symmetric, periodic nanoscale holes with spherical

SUBMITTER: Das GM 

PROVIDER: S-EPMC12362822 | biostudies-literature | 2025 Aug

REPOSITORIES: biostudies-literature