A Versatile Top-Down Patterning Technique for Perovskite On-Chip Integration.

ABSTRACT: Metal-halide perovskites (MHPs) have exciting optoelectronic properties and are under investigation for various applications, such as photovoltaics, light-emitting diodes, and lasers. An essential step toward exploiting the full potential of this class of materials is their large-scale, on-chip integration with high-resolution, top-down patterning. The development of such patterning methods for perovskite films is challenging because of their intrinsic ionic nature and adverse reactions with the solvents used in standard lithography processes. Here, we introduce a versatile and precise method comprising photolithography and reactive ion etching (RIE) processes that can be tuned to accommodate different perovskite compositions and morphologies. Our method utilizes conventional photoresists

SUBMITTER: Fabrizi F 

PROVIDER: S-EPMC12392744 | biostudies-literature | 2025 Aug

REPOSITORIES: biostudies-literature