Direct measurement of two-photon absorption and refraction properties of SZ2080^TM-based resists at 515 nm: insights into 3D printing.

ABSTRACT: Accurate knowledge of nonlinear optical parameters is essential for optimizing energy deposition in ultrafast laser 3D printing, yet these values remain undetermined for many commonly used materials. In this study, we address this gap by experimentally determining the two-photon absorption (TPA) and non-linear refraction coefficients (β and n ₂) of the widely used SZ2080^TM resist with the photo-initiators (PI) IRG369 and BIS (Irgacure 369 and 4,4' bis(diethylamino)-benzophenone or Michler's ketone). Using the Z-scan method at 515 nm with a low repetition rate (1 kHz) to avoid thermal accumulation, we found that the nonlinear response of the host polymer has a considerable contribution to energy deposition despite the addition of the PI, as the host polym

SUBMITTER: Stavrou M 

PROVIDER: S-EPMC12442362 | biostudies-literature | 2025 Sep

REPOSITORIES: biostudies-literature