Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission Spectroscopy.

ABSTRACT: Extreme ultraviolet (EUV) lithography has revolutionized the high-volume manufacturing of nanoscale components. The use of EUV light leads to ionization-driven chemistry in the imaging materials of lithography, the photoresists. The complex interplay of ionization, generation of primary/secondary electrons, and the subsequent chemical mechanisms that lead to image formation in photoresists has been notoriously difficult to study. This is in particular true for the radiochemical transformations occurring during exposure. In this work, we deploy table-top EUV photoemission spectroscopy to observe in situ chemical changes occurring during exposure in a model chemically amplified photoresist and discover a surprising chemical reaction pathway, the EUV-induced breakdown of a perfluoroalkyl subs

SUBMITTER: Singh DP 

PROVIDER: S-EPMC12447401 | biostudies-literature | 2025 Sep

REPOSITORIES: biostudies-literature