Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices.

ABSTRACT: We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.

SUBMITTER: Liu R 

PROVIDER: S-EPMC12464215 | biostudies-literature | 2025 Sep

REPOSITORIES: biostudies-literature