Chemical Mechanical Polishing of Zerodur^® Using Silica and Ceria Nanoparticles: Toward Ultra-Smooth Optical Surfaces.

ABSTRACT: This study investigates hyperpolishing of Zerodur^® substrates via chemical-mechanical polishing (CMP) using silica (SiO₂) and ceria (CeO₂) nanoparticles as controlled nano-abrasives. A pre-polishing stress-mirror stage was combined with systematic use of nanoparticles of variable size to evaluate surface-state evolution via optical rugosimeter, HRSEM, cross-sectional HRTEM, and XPS. A set of hexagonal mirrors with a circumscribed diameter of 30 mm was polished for one hour with each nanoparticle type. All tested slurries significantly improved surface quality, with both the smallest (37 nm) and largest (209 nm) SiO₂ particles achieving similar final roughness, though larger particles showed a slight performance advantage that could be offset by l

SUBMITTER: Bellahsene H 

PROVIDER: S-EPMC12472406 | biostudies-literature | 2025 Sep

REPOSITORIES: biostudies-literature