Graphene Growth via Plasma-Enhanced Hybrid Physical-Chemical Vapor Deposition: A Catalyst-Free Approach.

ABSTRACT: Graphene, with its prominent electrical properties, holds promise as an ideal material for a diverse range of applications, from electronics to optics. Yet, the feasibility of large-area integration in graphene remains constrained by its reliance on metal-based synthesis methods. Integrating graphene onto dielectric substrates is vital for microelectronic device fabrication. Hence, the catalyst-free fabrication of graphene emerges as a crucial pursuit for the future of microelectronic devices, aligning with the demands of integrated electronic technology. Here, we propose a plasma-enhanced hybrid physical-chemical vapor deposition (PE-HPCVD) method as a novel technique for the catalyst-free synthesis of graphene. Although the work is at its initial stages, it provides promising results of

SUBMITTER: Mahjoory A 

PROVIDER: S-EPMC12508919 | biostudies-literature | 2025 Oct

REPOSITORIES: biostudies-literature