High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity and consistency.

ABSTRACT: Vanadium dioxide (VO₂) is a phase transition material that experiences significant shifts in electrical, optical, and mechanical properties near its transition temperature. Among various methods for depositing VO₂ thin films, pulsed laser deposition (PLD) provides precise stoichiometric control, good versatility, and high consistency. In this work, we introduce an optimized PLD-based method for depositing high-quality polycrystalline VO₂ thin films. Experimental results demonstrate a resistance change of over four orders of magnitude during the phase transition, accompanied by high uniformity, with a thickness variation of less than 2% across a 100 mm wafer, and reliable reproducibility over time.

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SUBMITTER: Huang Z 

PROVIDER: S-EPMC12515231 | biostudies-literature | 2025

REPOSITORIES: biostudies-literature