Patchy nanoparticles by atomic stencilling.

ABSTRACT: Stencilling, in which patterns are created by painting over masks, has ubiquitous applications in art, architecture and manufacturing. Modern, top-down microfabrication methods have succeeded in reducing mask sizes to under 10 nm (refs. ^1,2), enabling ever smaller microdevices as today's fastest computer chips. Meanwhile, bottom-up masking using chemical bonds or physical interactions has remained largely unexplored, despite its advantages of low cost, solution-processability, scalability and high compatibility with complex, curved and three-dimensional (3D) surfaces^3,4. Here we report atomic stencilling to make patchy nanoparticles (NPs), using surface-adsorbed iodide submonolayers to create the mask and ligand-mediated grafted polymers onto unmasked regions as 'pain

SUBMITTER: Kim A 

PROVIDER: S-EPMC12527929 | biostudies-literature | 2025 Oct

REPOSITORIES: biostudies-literature