Microgravity-induced wet chemical etching of borosilicate glass enhances the process rate.

ABSTRACT: In the paper, microgravity simulators-Random Positioning Machine (RPM) and Rotary Wall Vessel (RWV) - were used to investigate the potential influence of quasi zero-gravity force onto the wet chemical etching of borosilicate glass substrates. For the first time, straight microchannels of different widths were etched utilizing RPM and RWV in a solution of hydrofluoric acid (HF) with additives (40% HF: 65% HNO3, 10:1, v/v). Substantial differences compared to the reference etching could be observed and the highest etching rate could be obtained for RPM (3.06 μm/min), next reference with a stirrer (2.01 μm/min) and RWV simulator (1.71 μm/min). For both RPM and RWV, also the potential aging of the solution, defined as the decrease of etching rates in a function of etched samples, was found to

SUBMITTER: Krakos A 

PROVIDER: S-EPMC12540641 | biostudies-literature | 2025 Oct

REPOSITORIES: biostudies-literature