Microstructural and Residual Stress Homogenization of Titanium Sputtering Targets for OLED 6G Applications Through Controlled Rolling and Heat Treatment.

ABSTRACT: The optimization of the microstructural homogeneity and residual stress distribution in Ti sputtering targets for OLED 6G applications is essential for improving dimensional stability, durability, and deposition performance. Herein, 3N Ti plates were hot-rolled at 730 °C and then annealed at 600 °C and 700 °C for different durations to investigate the effects of annealing parameters on microstructural evolution and stress relaxation. X-ray diffraction analysis revealed that hexagonal α-Ti with progressive development of the (002) orientation was produced during annealing under all the conditions. Electron backscatter diffraction analyses showed that short-time annealing at 600 °C (≤30 min) generated heterogeneous grains, high dislocation density, and mixed grain boundary character, whereas

SUBMITTER: Kang L 

PROVIDER: S-EPMC12608695 | biostudies-literature | 2025 Oct

REPOSITORIES: biostudies-literature