Dehydrogenation vs Apparent Hydrogenation: Unraveling the Mechanisms of He and O₂ Plasma Etching on Colloidal Nanocrystal Films.

ABSTRACT: Removing organic ligands from colloidal nanoparticles is critical for fabricating solid-state devices, yet accurately quantifying this removal remains a significant analytical challenge. Here, we establish a robust and accessible method for this quantification by calibrating Raman spectroscopy against precise ion beam analysis (IBA) for nanoparticle assemblies (CNAs) processed by helium (He) and oxygen (O₂) plasmas. We demonstrate that the calibration curves are remarkably independent of plasma power and pressure, depending critically only on the choice of feed gas. He plasma induces rapid dehydrogenation and cross-linking, evidenced by a much faster decrease in the C-H Raman signal relative to the actual carbon loss. Conversely, O₂ plasma leads to a surprising "appar

SUBMITTER: Shaw S 

PROVIDER: S-EPMC12635958 | biostudies-literature | 2025 Nov

REPOSITORIES: biostudies-literature