Wafer-scale uniform epitaxy of transferable 2D single crystals for gate-all-around nanosheet field effect transistors.

ABSTRACT: Gate-all-around (GAA) nanosheet field-effect transistors (FETs) with two-dimensional (2D) semiconductor channels surrounded by high-κ dielectrics show outstanding performance and hold promise for ultimate miniaturization in the post-Moore era. However, the synthesis of uniform wafer-scale 2D GAA nanosheet single crystals on industry-compatible substrates presents a considerable challenge. Herein, we report wafer-scale uniform growth of 2D high-κ oxide/semiconductor/high-κ oxide GAA single crystals on r-plane sapphire via buffered van der Waals (vdW) epitaxy. The 2D GAA heterostructures possess atomically flat interfaces, exhibiting superb uniformity and crystallinity across the wafer. Furthermore, the 2D GAA heterostructures can be transferred to diverse substrates owing to the vdW gap wit

SUBMITTER: Xue C 

PROVIDER: S-EPMC12658098 | biostudies-literature | 2025 Nov

REPOSITORIES: biostudies-literature