Low-Temperature Glass 3D Printing via Two-Photon and Single-Photon Polymerization of Oligo-Silsesquioxanes.

ABSTRACT: Recent advances in 3D printing of silica glass have highlighted the limitations of conventional stereolithography (SLA), which requires high-temperature sintering (≈1000 °C) and often uses slurry-based materials. To address these limitations, a sinterless approach using polyhedral oligomeric silsesquioxane (POSS)-based resin has gained attention, as it can form transparent fused silica at only 650 °C. However, previous POSS-based systems suffered from high shrinkage owing to the addition of organic monomers. In this study, a novel low-viscosity polymerizable POSS resin was synthesized without additional monomers, maintaining its sinterless properties while reducing shrinkage. Experimental results showed that our POSS resin has a silica content of 41%, with a shrinkage rate of only 36 ± 1%,

SUBMITTER: Chen L 

PROVIDER: S-EPMC12694004 | biostudies-literature | 2025 Dec

REPOSITORIES: biostudies-literature