Fabrication of Sub-50 nm Three-Dimensional Rhombic Zero-Depth PDMS Nanopores with Enhanced Conductance via Silicon Micro-Blade Molding.

ABSTRACT: Zero-depth nanopores present a promising solution to the challenges associated with ultrathin membranes used in solid-state resistive pulse sensors for DNA sequencing. Most existing fabrication methods are either complex or lack the nanoscale precision required. In this study, we introduce a cost-effective approach that combines PDMS molding at the intersection of silicon micro-blades with an innovative high-resolution nano-positioning technique. These blades are created through photolithography and a two-step KOH wet etching process, allowing for the formation of sub-50 nm 3D rhombic zero-depth nanopores featuring large vertex angles. To address the limitations of SEM imaging-such as dielectric charging and deformation of PDMS membranes under electron beam exposure-we devised a finite ele

SUBMITTER: Behzadi MM 

PROVIDER: S-EPMC12735173 | biostudies-literature | 2025 Dec

REPOSITORIES: biostudies-literature