Dual phase high temperature Si₃N₄/Al(Ti)N films with tunable thermal conductivity.

ABSTRACT: Engineering amorphous dielectric films with tunable thermal conductivity is advantageous for the thermal management of semiconductor devices and thermal insulation of aerospace applications. Here, we demonstrate that incorporating dense dispersed amorphous Al(Ti)N (~1 nm or above) nanoparticles having phase volume fractions from 6 to 70 %, has a negligible effect on the intrinsic thermal conductivity of the amorphous Si₃N₄ matrix (~2 W m^-1K^-1), in which the wave-like 'propagons' in Allen-Feldmann theory are believed to be unsupressed and non-tuned. By contrast, incorporating (5-15 nm) crystalline TiN phases significantly increases the thermal conductivity (up to 15 W m^-1K^-1). Critically, the micrometre-thick Si₃N<

SUBMITTER: Gao Z 

PROVIDER: S-EPMC12749134 | biostudies-literature | 2025 Dec

REPOSITORIES: biostudies-literature