Absorption-coefficient calculation of short-wavelength photoresist materials: From EUV to BEUV and water window X-ray.

ABSTRACT: In photolithography, shortening the exposure wavelength from ultraviolet to extreme ultraviolet (EUV, 13.5 nm) and soft X-ray region in terms of beyond EUV (BEUV, 6.X nm) and water window X-ray (WWX, 2.2-4.4 nm) is expected to further miniaturize the technology node down to sub-5 nm level. However, the absorption ability of molecules in these ranges, especially WWX region, is unknown, which should be very important for the utilization of energy. Herein, the molar absorption cross sections of different elements at 2.4 nm of WWX were firstly calculated and compared with the wavelengths of 13.5 nm and 6.7 nm. Based on the absorption cross sections in these ranges and density estimation results from the density-functional theory calculation, the linear absorption coefficients of typical resist

SUBMITTER: Peng Y 

PROVIDER: S-EPMC12755219 | biostudies-literature | 2025 Dec

REPOSITORIES: biostudies-literature