Nanoscale Depth Profiling of Optoelectronic Devices Using Deep-UV LIBS.

ABSTRACT: Accurate elemental nanoscale depth profiling is vital for semiconductor junctions, optical coatings, and thin-film photonic devices. While Secondary Ion Mass Spectrometry (SIMS) is capable of providing nanoscale elemental depth profiling, it requires bulky and complex instrumentation and is not portable for real-time process monitoring. Alternatively, the technique of Laser-Induced Breakdown Spectroscopy (LIBS) has been shown to provide sensitive detection of elements; however, its depth resolution is limited to approximately μm, hindering nanoscale profiling. Here, we demonstrate nanoscale elemental depth profiling (∼10s of nm) using deep UV LIBS under ambient conditions. Using a fiber-coupled 266 nm wavelength (UV-C) pulsed laser, the system achieves an ablation depth as low as ∼20-25 nm

SUBMITTER: Surampudi A 

PROVIDER: S-EPMC12771208 | biostudies-literature | 2025 Dec

REPOSITORIES: biostudies-literature