Diffraction-limit-breaking digital projection lithography via multi-exposure strategies for high-density nanopatterning.

ABSTRACT: Digital micromirror device-based maskless projection lithography (DMPL) has emerged as a transformative nanopatterning platform, yet faces fundamental challenges in resolving high-density nanostructures due to optical diffraction constraints. The filtering characteristics of the pupil function and the phase modulation caused by defocus lead to pattern distortion and loss of high-frequency information, making it difficult to ensure consistency and distinguishability in dense pattern lithography. Here, we introduce multiple exposures (ME) to DMPL, developing a multiple-exposure without alignment solution to solve the problem of indistinguishable dense pattern exposure. At the same time, we also propose a novel method to maximize the spacing uniformity of the layout decomposition scheme based

SUBMITTER: Liang ZX 

PROVIDER: S-EPMC12779640 | biostudies-literature | 2026 Jan

REPOSITORIES: biostudies-literature