Morphological evolution of silicon surfaces nanopatterned by focused ion beam irradiation.

ABSTRACT: Nanopatterning on solid surface has emerged as an important tool in the field of nanotechnology, nano/micro-electromechanical systems (NEMS/MEMS), photonics, and biotechnology. Among the available techniques, focused ion beam (FIB) enables controlled and precise nanopatterning on solid surfaces. The formation and evolution of nanoripple patterns on silicon (Si) surfaces by 30 keV Ga⁺ focused ion beam (FIB) irradiation has been investigated in this study. We perform a systematic study to investigate the well-defined ripple pattern formation by conducting experiments at different ion incidence angles (0°-45°), ion energies (10-30 keV), and ion fluences. Well-defined ripple patterns are observed near 30° ion incidence angle, with ripple periodicity and amplitude strongly dependent on ion flue

SUBMITTER: Bhowmik D 

PROVIDER: S-EPMC12860792 | biostudies-literature | 2026 Jan

REPOSITORIES: biostudies-literature