Colloids with high-definition surface structures.

ABSTRACT: Compared with the well equipped arsenal of surface modification methods for flat surfaces, techniques that are applicable to curved, colloidal surfaces are still in their infancy. This technological gap exists because spin-coating techniques used in traditional photolithographic processes are not applicable to the curved surfaces of spherical objects. By replacing spin-coated photoresist with a vapor-deposited, photodefinable polymer coating, we have now fabricated microstructured colloids with a wide range of surface patterns, including asymmetric and chiral surface structures, that so far were typically reserved for flat substrates. This high-throughput method can yield surface-structured colloidal particles at a rate of approximately 10(7) to 10(8) particles per operator per day. Equipp

SUBMITTER: Chen HY 

PROVIDER: S-EPMC2040871 | biostudies-literature | 2007 Jul

REPOSITORIES: biostudies-literature