Lamellar Diblock Copolymer Thin Films during Solvent Vapor Annealing Studied by GISAXS: Different Behavior of Parallel and Perpendicular Lamellae.

ABSTRACT: The reorientation of lamellae and the dependence of the lamellar spacing, D_lam, on polymer volume fraction, ϕ_P, D_lam ∝ ϕ_P^-β, in diblock copolymer thin films during solvent vapor annealing (SVA) are examined by combining white light interferometry (WLI) and grazing-incidence small-angle X-ray scattering (GISAXS). A thin film of lamellae-forming poly(styrene-b-butadiene) prepared by spin-coating features lamellae of different orientations with the lamellar spacing depending on orientation. During annealing with ethyl acetate (EAC) vapor, it is found that perpendicular lamellae behave differently from parallel ones, which is due to the fact that their initial lamellar thicknesses differ strongly. Quantitatively, the s

SUBMITTER: Zhang J 

PROVIDER: S-EPMC4150605 | biostudies-literature | 2014 Aug

REPOSITORIES: biostudies-literature