Ex situ and in situ characterization of patterned photoreactive thin organic surface layers using friction force microscopy.

ABSTRACT: Photolithographic methods allow an easy lateral top-down patterning and tuning of surface properties with photoreactive molecules and polymers. Employing friction force microscopy (FFM), we present here different FFM-based methods that enable the characterization of several photoreactive thin organic surface layers. First, three ex situ methods have been evaluated for the identification of irradiated and non-irradiated zones on the same organosilane sample by irradiation through different types of masks. These approaches are further extended to a time dependent ex situ FFM measurement, which allows to study the irradiation time dependent evolution of the resulting friction forces by sequential irradiation through differently sized masks in crossed geometry. Finally, a newly designed in sit

SUBMITTER: Shen Q 

PROVIDER: S-EPMC4286208 | biostudies-literature | 2014 Nov-Dec

REPOSITORIES: biostudies-literature