Maskless Lithography and in situ Visualization of Conductivity of Graphene using Helium Ion Microscopy.

ABSTRACT: The remarkable mechanical and electronic properties of graphene make it an ideal candidate for next generation nanoelectronics. With the recent development of commercial-level single-crystal graphene layers, the potential for manufacturing household graphene-based devices has improved, but significant challenges still remain with regards to patterning the graphene into devices. In the case of graphene supported on a substrate, traditional nanofabrication techniques such as e-beam lithography (EBL) are often used in fabricating graphene nanoribbons but the multi-step processes they require can result in contamination of the graphene with resists and solvents. In this letter, we report the utility of scanning helium ion lithography for fabricating functional graphene nanoconductors that are

SUBMITTER: Iberi V 

PROVIDER: S-EPMC4493665 | biostudies-literature | 2015 Jul

REPOSITORIES: biostudies-literature