Automated Defect and Correlation Length Analysis of Block Copolymer Thin Film Nanopatterns.

ABSTRACT: Line patterns produced by lamellae- and cylinder-forming block copolymer (BCP) thin films are of widespread interest for their potential to enable nanoscale patterning over large areas. In order for such patterning methods to effectively integrate with current technologies, the resulting patterns need to have low defect densities, and be produced in a short timescale. To understand whether a given polymer or annealing method might potentially meet such challenges, it is necessary to examine the evolution of defects. Unfortunately, few tools are readily available to researchers, particularly those engaged in the synthesis and design of new polymeric systems with the potential for patterning, to measure defects in such line patterns. To this end, we present an image analysis tool, which we h

SUBMITTER: Murphy JN 

PROVIDER: S-EPMC4514826 | biostudies-literature | 2015

REPOSITORIES: biostudies-literature