Rapid epitaxy-free graphene synthesis on silicidated polycrystalline platinum.

ABSTRACT: Large-area synthesis of high-quality graphene by chemical vapour deposition on metallic substrates requires polishing or substrate grain enlargement followed by a lengthy growth period. Here we demonstrate a novel substrate processing method for facile synthesis of mm-sized, single-crystal graphene by coating polycrystalline platinum foils with a silicon-containing film. The film reacts with platinum on heating, resulting in the formation of a liquid platinum silicide layer that screens the platinum lattice and fills topographic defects. This reduces the dependence on the surface properties of the catalytic substrate, improving the crystallinity, uniformity and size of graphene domains. At elevated temperatures growth rates of more than an order of magnitude higher (120 μm min(-1)) than ty

SUBMITTER: Babenko V 

PROVIDER: S-EPMC4518308 | biostudies-literature | 2015 Jul

REPOSITORIES: biostudies-literature