Site-selective local fluorination of graphene induced by focused ion beam irradiation.

ABSTRACT: The functionalization of graphene remains an important challenge for numerous applications expected by this fascinating material. To keep advantageous properties of graphene after modification or functionalization of its structure, local approaches are a promising road. A novel technique is reported here that allows precise site-selective fluorination of graphene. The basic idea of this approach consists in the local radicalization of graphene by focused ion beam (FIB) irradiation and simultaneous introduction of XeF2 gas. A systematic series of experiments were carried out to outline the relation between inserted defect creation and the fluorination process. Based on a subsequent X-ray photoelectron spectroscopy (XPS) analysis, a 6-fold increase of the fluorine concentration on graphene u

SUBMITTER: Li H 

PROVIDER: S-EPMC4731758 | biostudies-literature | 2016 Jan

REPOSITORIES: biostudies-literature