Large-Area Growth of Turbostratic Graphene on Ni(111) via Physical Vapor Deposition.

ABSTRACT: Single-layer graphene has demonstrated remarkable electronic properties that are strongly influenced by interfacial bonding and break down for the lowest energy configuration of stacked graphene layers (AB Bernal). Multilayer graphene with relative rotations between carbon layers, known as turbostratic graphene, can effectively decouple the electronic states of adjacent layers, preserving properties similar to that of SLG. While the growth of AB Bernal graphene through chemical vapor deposition has been widely reported, we investigate the growth of turbostratic graphene on heteroepitaxial Ni(111) thin films utilizing physical vapor deposition. By varying the carbon deposition temperature between 800 -1100 °C, we report an increase in the graphene quality concomitant with a transition in th

SUBMITTER: Garlow JA 

PROVIDER: S-EPMC4731759 | biostudies-literature | 2016 Jan

REPOSITORIES: biostudies-literature