Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics.

ABSTRACT: The laser damage precursors in subsurface of fused silica (e.g. photosensitive impurities, scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-frequency ultrasonic agitation, respectively. The comparison of scratches morphology after static etching and high-frequency ultrasonic agitation etching was devoted in our case. And comparison of laser induce damage resistance of scratched and non-scratched fused silica surfaces after HF etching with high-frequency ultrasonic agitation were also investigated in this study. The global laser induce damage resistance was increased significantly after the laser damage precursors were mitigated in this case. The redeposition of reaction produce was avoided by involving multi-frequency ultrasonic

SUBMITTER: Ye X 

PROVIDER: S-EPMC4971457 | biostudies-literature | 2016 Aug

REPOSITORIES: biostudies-literature