Non-destructive imaging of buried electronic interfaces using a decelerated scanning electron beam.

ABSTRACT: Recent progress in nanotechnology enables the production of atomically abrupt interfaces in multilayered junctions, allowing for an increase in the number of transistors in a processor. However, uniform electron transport has not yet been achieved across the entire interfacial area in junctions due to the existence of local defects, causing local heating and reduction in transport efficiency. To date, junction uniformity has been predominantly assessed by cross-sectional transmission electron microscopy, which requires slicing and milling processes that can potentially introduce additional damage and deformation. It is therefore essential to develop an alternative non-destructive method. Here we show a non-destructive technique using scanning electron microscopy to map buried junction prop

SUBMITTER: Hirohata A 

PROVIDER: S-EPMC5025776 | biostudies-literature | 2016 Sep

REPOSITORIES: biostudies-literature