Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.

ABSTRACT: A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

SUBMITTER: Jeong HH 

PROVIDER: S-EPMC5115431 | biostudies-literature | 2015 Jul

REPOSITORIES: biostudies-literature