Model for large-area monolayer coverage of polystyrene nanospheres by spin coating.

ABSTRACT: Nanosphere lithography, an inexpensive and high throughput technique capable of producing nanostructure (below 100 nm feature size) arrays, relies on the formation of a monolayer of self-assembled nanospheres, followed by custom-etching to produce nanometre size features on large-area substrates. A theoretical model underpinning the self-ordering process by centrifugation is proposed to describe the interplay between the spin speed and solution concentration. The model describes the deposition of a dense and uniform monolayer by the implicit contribution of gravity, centrifugal force and surface tension, which can be accounted for using only the spin speed and the solid/liquid volume ratio. We demonstrate that the spin recipe for the monolayer formation can be represented as a pathway on a

SUBMITTER: Chandramohan A 

PROVIDER: S-EPMC5244356 | biostudies-literature | 2017 Jan

REPOSITORIES: biostudies-literature