Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation.
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ABSTRACT:
SUBMITTER: Mameli A
PROVIDER: S-EPMC5384477 | biostudies-literature | 2017 Feb
REPOSITORIES: biostudies-literature
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Area-Selective Atomic Layer Deposition of In<sub>2</sub>O<sub>3</sub>:H Using a μ-Plasma Printer for Local Area Activation.
Mameli Alfredo A Kuang Yinghuan Y Aghaee Morteza M Ande Chaitanya K CK Karasulu Bora B Creatore Mariadriana M Mackus Adriaan J M AJ Kessels Wilhelmus M M WM Roozeboom Fred F
Chemistry of materials : a publication of the American Chemical Society 20170123 3
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