Boosting Hole Mobility in Coherently Strained [110]-Oriented Ge-Si Core-Shell Nanowires.

ABSTRACT: The ability of core-shell nanowires to overcome existing limitations of heterostructures is one of the key ingredients for the design of next generation devices. This requires a detailed understanding of the mechanism for strain relaxation in these systems in order to eliminate strain-induced defect formation and thus to boost important electronic properties such as carrier mobility. Here we demonstrate how the hole mobility of [110]-oriented Ge-Si core-shell nanowires can be substantially enhanced thanks to the realization of large band offset and coherent strain in the system, reaching values as high as 4200 cm²/(Vs) at 4 K and 1600 cm²/(Vs) at room temperature for high hole densities of 10¹⁹ cm^-3. We present a direct correlation of (i) mobilit

SUBMITTER: Conesa-Boj S 

PROVIDER: S-EPMC5391496 | biostudies-literature | 2017 Apr

REPOSITORIES: biostudies-literature