Proximity Effect induced transport Properties between MBE grown (Bi_1-xSb_x)₂Se₃ Topological Insulators and Magnetic Insulator CoFe₂O₄.

ABSTRACT: In this study, we investigate the proximity effect in topological insulator (TI) and magnetic insulator bilayer system. (Bi_1-xSb_x)₂Se₃/CoFe₂O₄ (CFO) heterostructure was fabricated using molecular beam epitaxy and pulsed laser deposition system respectively. As revealed from the magnetoresistance measurement, the weak anti-localization (WAL) is strongly suppressed by proximity effect in (Bi_1-xSb_x)₂Se₃/CFO interface. Modified Hikama-Larkin-Nagaoka equation was used to fit the WAL results so that the size of surface state gap can be extracted successfully. The temperature-dependent resistance of the heterostructures at small and large perpendicular magnetic fields were also measured a

SUBMITTER: Huang SY 

PROVIDER: S-EPMC5445069 | biostudies-literature | 2017 May

REPOSITORIES: biostudies-literature