A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices.

ABSTRACT: Patterning micro-structures on highly hydrophobic surface by photolithography is usually inevitable for fabricating devices based on electrowetting effects. The key challenges for such photolithography processes are how to coat photoresist uniformly and maintain the hydrophobicity of the highly hydrophobic surface, which are usually two contradict aspects. Moreover, the patterned microstructure must adhere to the highly hydrophobic surface excellently, which is critical for device application. However, a simple and robust fabrication process that fulfills all the above requirements was seldom reported. In this paper, we developed a sacrificial layer photolithography strategy on highly hydrophobic surface. Photoresist is easily coated uniformly all over the substrate by introducing a sacrif

SUBMITTER: Zhang H 

PROVIDER: S-EPMC5479844 | biostudies-literature | 2017 Jun

REPOSITORIES: biostudies-literature