Atomic-Layer-Deposition Assisted Formation of Wafer-Scale Double-Layer Metal Nanoparticles with Tunable Nanogap for Surface-Enhanced Raman Scattering.

ABSTRACT: A simple high-throughput approach is presented in this work to fabricate the Au nanoparticles (NPs)/nanogap/Au NPs structure for surface enhanced Raman scattering (SERS). This plasmonic nanostructure can be prepared feasibly by the combination of rapid thermal annealing (RTA), atomic layer deposition (ALD) and chemical etching process. The nanogap size between Au NPs can be easily and precisely tuned to nanometer scale by adjusting the thickness of sacrificial ALD Al₂O₃ layer. Finite-difference time-domain (FDTD) simulation data indicate that most of enhanced field locates at Au NPs nanogap area. Moreover, Au NPs/nanogap/Au NPs structure with smaller gap exhibits the larger electromagnetic field. Experimental results agree well with FDTD simulation data, the plasmonic

SUBMITTER: Cao YQ 

PROVIDER: S-EPMC5507941 | biostudies-literature | 2017 Jul

REPOSITORIES: biostudies-literature