Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells.

ABSTRACT: We demonstrated fabrication of a parabola shaped Si nanostructures of various periods by combined approach of nanosphere lithography and a single step CF₄/O₂ reactive ion etch (RIE) process. Silica nanosphere monolayers in a hexagonal array were well deposited by a solvent controlled spin coating technique based on binary organic solvents. We showed numerically that a parabolic Si nanostructure of an optimal period among various-shaped nanostructures overcoated with a dielectric layer of a 70 nm thickness provide the most effective antireflection. As the simulation results as a design guide, we fabricated the parabolic Si nanostructures of a 520 nm period and a 300 nm height exhibiting the lowest weighted reflectance of 2.75%. With incorporation of such parabolic Si n

SUBMITTER: Cheon SE 

PROVIDER: S-EPMC5544770 | biostudies-literature | 2017 Aug

REPOSITORIES: biostudies-literature