Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker.

ABSTRACT: Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines

SUBMITTER: Choi C 

PROVIDER: S-EPMC5701260 | biostudies-literature | 2017 Nov

REPOSITORIES: biostudies-literature