Reflective Small Angle Electron Scattering to Characterize Nanostructures on Opaque Substrates.

ABSTRACT: Features sizes in integrated circuits (ICs) are often at the scale of 10 nm and are ever shrinking. ICs appearing in today's computers and hand held devices are perhaps the most prominent examples. These smaller feature sizes demand equivalent advances in fast and accurate dimensional metrology for both development and manufacturing. Techniques in use and continuing to be developed include X-ray based techniques, optical scattering and of course the electron and scanning probe microscopy techniques. Each of these techniques have their advantages and limitations. Here the use of small angle electron beam scattering measurements in a reflection mode (RSAES) to characterize the dimensions and the shape of nanostructures on flat and opaque substrates is demonstrated using both experimental and

SUBMITTER: Friedman LH 

PROVIDER: S-EPMC5726286 | biostudies-literature | 2017 Sep

REPOSITORIES: biostudies-literature